Prof. Kim`s R.P.

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  • 6 S. Choi†, S. Kim†, J. Jang, J. Kim, D. M. Kim, S.-J. Choi, H.-S. Mo, S. M. Lee*, and D. H. Kim* (†These authors equally contributed to this work,*co-corresponding authors) "Oxygen Content and Bias Influence on Amorphous InGaZnO TFT-Based Temperature Sensor Performance" IEEE Electron Device Lett., accepted, 2019-08
  • 5 Y. Lee, H. Jung, B. Choi, J. Yoon, H. B. Yoo, H.-J. Kim, G.-H. Park, D. M. Kim, D. H. Kim, M.-H. Kang*, and S.-J. Choi* (*co-corresponding authors) "Flexible carbon nanotube Schottky diode and its integrated circuit applications" RSC Advances, vol. 9, no. 38, pp. 22124-22128, DOI:10.1039/c9ra02855b, 2019-07 PDF
  • 4 S. Choi, S. Kim, J. Jang, G. Ahn, J. T. Jang, J. Yoon, T. J. Park, B.-G. Park, D. M. Kim, S.-J. Choi, S. M. Lee, E. Y. Kim, H. S. Mo*, D. H. Kim* (*co-corresponding authors) "Implementing an Artificial Synapse and Neuron Using a Si Nanowire Ion-Sensitive Field-Effect Transistor and Indium-Gallium-Zinc-Oxide Memristors" Sensors and Actuators B:Chemical, vol. 296, no. 126616, pp. 1-9, DOI: 10.1016/j.snb.2019.05.093, 2019-10 PDF
  • 3 S. Choi, S. Park, J.-Y. Kim, J. Rhee, H. Kang, D. M. Kim, S.-J. Choi, D. H. Kim* "Influence of the gate/drain voltage configuration on the current stress instability in amorphous indium-zinc-oxide thin-film transistors with self-aligned top-gate structure" IEEE Electron Device Letters, vol. 40, no. 9, pp. 1431-1434, DOI : 10.1109/LED.2019.2927378, 2019-09 PDF
  • 2 S. Choi, J.-Y Kim, J. Rhee, H. Kang, S. Park, D. M. Kim, S.-J Choi, D. H. Kim* "Method to extract interface and bulk trap separately over the full sub-gap range in amorphous InGaZnO thin-film transistors by using various channel thicknesses" IEEE Electron Device Letters, vol. 40, no. 4, pp. 574-577, DOI 10.1109/LED.2019.2898217, 2019-02 PDF
  • 1 J. T. Jang§, H. Kang§, H. R. Yu, E. S. Kim, K. S. Son, S.-H. Cho, D. M. Kim, S.-J. Choi, D. H. Kim* "The Influence of Anion Composition on Subgap Density of States and Electrical Characteristics in ZnON Thin-Film Transistors" IEEE Electron Device Letters, vol. 40, no. 1, pp. 40-43, DOI: 10.1109/LED.2018.2883732, 2019-01 PDF